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Więcej informacji o CMOS Gate-Stack Scaling - Materials, Interfaces and Reliability Implications: Volume 1155

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Opis

To address the increasing demands of device scaling, new materials are being introduced into conventional Si CMOS processing at an unprecedented rate. Presentations collected here focus on understanding, from a chemistry and materials perspective, the mechanism of interface formation and defects at interfaces, for both conventional Si and alternative channel (Ge or III-V) systems. Several papers address reliability concerns for high-k/metal gate (basic physical models, charge trapping, etc.), while others cover characterization of the thin films and interfaces which comprise the gate stack. Topics include: advanced Si-based gate stacks; and alternate channel materials.

Szczegóły książki

Kategoria Książki po angielsku Technology, engineering, agriculture Mechanical engineering & materials Materials science

• Pełny tytuł: CMOS Gate-Stack Scaling - Materials, Interfaces and Reliability Implications: Volume 1155
• Autor: Alexander A. DemkovBill TaylorH. Rusty HarrisJeffery W. Butterbaugh
• Język: Angielski
• Oprawa: Twarda
• Liczba stron: 194
• EAN: 9781605111285
• ISBN: 1605111287
• ID: 02060485
• Wydawca: Materials Research Society
• Waga: 430 g
• Wymiary: 236 × 160 × 14 mm
• Data wydania: 19. November 2009

Ulubione w innej kategorii

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