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Opis

Process Technology for Semiconductor Lasers describes the design principles of semiconductor lasers, mainly from the fabrication point of view. Starting out with the history of semiconductor-laser development and applications the materials for use in lasing from short to long wavelengths are reviewed. The basic design principles for semiconductor- laser devices and the epitaxy for laser production are discussed. An entire chapter is devoted to the technology of liquid-phase epitaxy, and another one to vapor-phase and beam epitaxies, respectively. The characterizations of laser materials, and the fabrication and characteristics of semiconductor lasers are treated. Mode-control techniques are presented, and surface-emitting lasers are introduced in the final chapter. A description of the design principles, seen mainly from the fabrication point of view. Following a review of the historical development and of the materials used in lasing at short to long wavelengths, the book goes on to discuss the basic design principles for semiconductor-laser devices and the epitaxy for laser production. One entire chapter is devoted to the technology of liquid-phase epitaxy, while another treats vapor-phase and beam epitaxies. The whole is rounded off with mode-control techniques and an introduction to surface-emitting lasers.

Szczegóły książki

Kategoria Książki po angielsku Technology, engineering, agriculture Electronics & communications engineering Electronics engineering

• Pełny tytuł: Process Technology for Semiconductor Lasers
• Podtytuł: Crystal Growth and Microprocesses
• Autor: Kenichi Iga, Susumu Kinoshita
• Język: Angielski
• Oprawa: Miękka
• Liczba stron: 169
• EAN: 9783642795787
• ISBN: 3642795781
• ID: 06969814
• Wydawca: Springer-Verlag Berlin and Heidelberg GmbH & Co. KG
• Waga: 295 g
• Wymiary: 235 × 155 × 11 mm
• Data wydania: 21. December 2011

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